300mm Productivity at Scale
The TS 12 Series is a modern, modular horizontal furnace platform for 300 mm wafers. It supports up to six atmospheric process reactors and delivers excellent performance in high-temperature applications up to 1,250 °C. Choose from versatile two- or three-stack configurations with several automation options, or a fully automated six-reactor cluster designed to maximize productivity and cost-of-ownership performance.
An atmospheric diffusion process is a heat treatment in a mostly inert environment which distributes dopants in a silicon, GaAs, InP or other semiconductor wafer to a desired depth, changing the electrical properties of the semiconductor. Sometimes a reactive element such as oxygen is added, consuming silicon and converting it into silicon dioxide (SiO2) for use in many applications.
Tempress offers furnace solutions for various other processes such as wafer splitting (SOI/POI) and polyimide curing, and is open to customise and co-develop specific thermal processes to fit your needs.